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Analytical Modeling of Asymmetric Junctionless DMDG MOSFET for Suppressing Short Channel Effects

机译:抑制短沟道效应的非对称无结DMDG MOSFET的解析模型

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In this paper, an analytical model is proposed for Asymmetric Junctionless dual material double gate (AJDMDG) MOSFETs structure with high K dielectric material for developing electrostatic potential, electric field, front gate threshold voltage (Vth), subthreshold swing (SS). The electrostatic potential is found by solving Poisson’s equation through parabolic approximation method. Moreover, the analytical model is developed for asymmetric nature in device performance through altering back gate oxide thicknesses and voltage. The substantial outcomes of analytical solution are compared with the result of TCAD simulation to validate the device structure. A comparative study has been carried for AJDMDG and junctionless DMDG (JDMDG) MOSFET structure to show the efficacy of asymmetric operation in device performance for suppressing short channel effects (SCEs).
机译:本文提出了一种具有高K介电材料的非对称无结双材料双栅极(AJDMDG)MOSFET结构的解析模型,用于开发静电势,电场,前栅极阈值电压(V ),亚阈值摆幅(SS)。通过抛物线近似法求解泊松方程可以找到静电势。此外,通过改变背栅氧化物的厚度和电压,为器件性能的不对称性开发了分析模型。将分析解决方案的实质结果与TCAD仿真的结果进行比较,以验证设备结构。已经对AJDMDG和无结DMDG(JDMDG)MOSFET结构进行了比较研究,以显示不对称操作在器件性能中抑制短沟道效应(SCE)的功效。

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