首页> 外文会议>Electron Devices and Solid-State Circuits, 2005 IEEE Conference on >A Compact, Analytical Two-dimensional Threshold Voltage Model for Cylindrical, Fully-depleted, Surrounding-Gate(SG) MOSFETs
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A Compact, Analytical Two-dimensional Threshold Voltage Model for Cylindrical, Fully-depleted, Surrounding-Gate(SG) MOSFETs

机译:圆柱形,全耗尽,环绕栅(SG)MOSFET的紧凑型分析二维阈值电压模型

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Based on two-dimensional(2D) potential analysis, a compact, analytical model for threshold voltage in cylindrical, fully-depleted, surrounding-gate(SG) MOSFETs is derived. The minimum surface potential μmin,surfaceis used to develop the threshold voltage model. Besides decreasing the characteristic factor, both the thin silicon body and gate oxide can reduce the threshold voltage roll-off simultaneously. It is also found that the threshold voltage shift is dependent on the scaling factor of λ1L. The high scaling factor is preferred to alleviate threshold voltage degradation.
机译:基于二维(2D)电位分析,推导了紧凑的圆柱形全耗尽环绕栅(SG)MOSFET阈值电压的分析模型。最小表面电势μ min,surface 用于建立阈值电压模型。除了降低特性因子之外,薄硅体和栅极氧化物都可以同时降低阈值电压的下降。还发现阈值电压漂移取决于λ 1 L的比例因子。优选高比例因子以减轻阈值电压降级。

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