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A new two-dimensional threshold voltage model for cylindrical, fully-depleted, surrounding-gate (SG) MOSFETs

机译:适用于圆柱型全耗尽环绕栅(SG)MOSFET的新二维阈值电压模型

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摘要

Based on two-dimensional (2D) Poisson potential solution, a compact, analytical model for threshold voltage in cylindrical, fully-depleted, surrounding-gate (SG) MOSFETs is successfully derived. The minimum surface potential φ_(min, surface) is used to develop the threshold voltage model. Besides decreasing the characteristic factor, both the thin silicon body and gate oxide can reduce the threshold voltage roll-off simultaneously. It is also found that the threshold voltage shift is dependent on the scaling factor of λ_1L. The high scaling factor is preferred to alleviate threshold voltage degradation.
机译:基于二维(2D)泊松电势解决方案,成功地推导出了圆柱型全耗尽环绕栅(SG)MOSFET中阈值电压的紧凑型分析模型。最小表面电势φ_(min,surface)用于建立阈值电压模型。除了降低特性因子之外,薄硅体和栅极氧化物都可以同时降低阈值电压的下降。还发现,阈值电压偏移取决于λ_1L的比例因子。优选高比例因子以减轻阈值电压降级。

著录项

  • 来源
    《Microelectronics & Reliability》 |2007年第3期|p.379-383|共5页
  • 作者

    T.K. Chiang;

  • 作者单位

    Department of Electronic Engineering, Southern Taiwan University of Technology, No.1, Nan-tat Street, Yung-kang City, Tainan County, Taiwan, ROC;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 一般性问题;
  • 关键词

  • 入库时间 2022-08-18 01:27:56

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