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Comparative evaluation results of CMS replacement resist for e-beam reticle fabrication

机译:CMS替代抗蚀剂在电子束掩模版制造中的比较评估结果

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Abstract: Looking for a CMS replacement resist is an urgent assignment for e-beam reticle fabrication, which enables us to maintain flexibility of reticle fabrications. CMS-EX series was discontinued in 1995, and its stored resin will be used up completely sooner in this year 1999. We then tried to find a replacement resist, and examined commercially available resist SEL-N1000, SEL-N1100 and ZEN4400. We studied their behavior to post-spin baking temperature respectively, in order to bring out their potential, by investigating isolated clear pattern fidelity in details as it was the most tough one to make by a negative-working resist. This paper describes our comparative evaluation results of commercially available negative-working resists to determine a CMS-EX-S replacement for e-beam reticle fabrication. !4
机译:摘要:寻找CMS替代抗蚀剂是电子束掩模版制造的紧迫任务,这使我们能够保持掩模版制造的灵活性。 CMS-EX系列于1995年停产,其存储的树脂将于1999年更早用完。然后,我们试图找到替代的抗蚀剂,并研究了市售的抗蚀剂SEL-N1000,SEL-N1100和ZEN4400。通过详细研究孤立的清晰图案保真度,我们分别研究了它们在旋转后烘烤温度下的行为,以发挥其潜力,因为它是负性抗蚀剂最难制作的。本文介绍了我们对市售负性光刻胶的比较评估结果,以确定用于电子束掩模版制造的CMS-EX-S替代品。 !4

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