IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
Intel Corp., 222501 NW 229~(th) Ave., Hillsboro, OR97124, USA;
On assignment from Intel Corporation;
On assignment from Samsung Electronics;
On assignment form Micron Technology;
On assignment from Matsushita E;
EUV lithography; EUV resists EUV reticles; defect printability; shadowing effect; and flare mitigation;
机译:EUV平版印刷术准备投入生产:IMEC EUV计划
机译:EUV平版印刷术准备投入生产:IMEC EUV计划
机译:IMEC演示了具有高NA EUV干扰光刻的20nm间距线/空间抗蚀剂成像
机译:全场EUV光刻在IMEC成为现实
机译:EUV光刻系统幅度和相位瞳孔变化的测量
机译:高敏感性抗蚀性对EUV光刻进行抗衡性:材料设计策略和绩效结果综述
机译:EUV光刻插入制造中的准备情况:IMEC EUV计划