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Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program

机译：EUV光刻插入制造中的准备情况：IMEC EUV计划

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Eric Hendrickx; Roel Gronheid; Jan Hermans; Gian Lorusso; Philippe Foubert; Ivan Pollentier; Anne-Marie Goethals; Rik Jonckheere; Geert Vandenberghe; Kurt Ronse;
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1. Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program [J] . Eric Hendrickx, Roel Gronheid, Jan Hermans Journal of Photopolymer Science and Technology . 2013,第5期

机译：EUV平版印刷术准备投入生产：IMEC EUV计划
2. Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program [J] . Eric Hendrickx, Roel Gronheid, Jan Hermans, Journal of Photopolymer Science and Technology . 2013,第5期

机译：EUV平版印刷术准备投入生产：IMEC EUV计划
3. Status of EUV Resist and Process Development at IC Manufacture to Implement EUV Lithography to 2X DRAM and Beyond [J] . Hyun-Woo Kim, Hai-Sub Na, Chang-Min Park Journal of Photopolymer Science and Technology . 2011,第2期

机译：将EUV光刻技术应用于2X DRAM及其以后的工艺，IC制造商的EUV抗蚀剂现状和工艺开发
4. EUV lithography program at IMEC [C] . Anne Marie Goethals, Rik Jonckheere, Gian Francesco Lorusso, Emerging Lithographic Technologies XI pt.1; Proceedings of SPIE-The International Society for Optical Engineering; vol.6517 pt.1 . 2006

机译：IMEC的EUV光刻程序
5. Measurement of Amplitude and Phase Pupil Variation for EUV Lithography Systems [D] . Levinson, Zachary A. 2018

机译：EUV光刻系统幅度和相位瞳孔变化的测量
6. High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results [O] . Theodore Manouras, Panagiotis Argitis 2020

机译：高敏感性抗蚀性对EUV光刻进行抗衡性：材料设计策略和绩效结果综述
7. Status of EUV Resist and Process Development at IC Manufacture to Implement EUV Lithography to 2X DRAM and Beyond [O] . Hyun-Woo Kim, Hai-Sub Na, Chang-Min Park, 2011

机译：EUV抗蚀剂和IC制造过程开发的现状，实现EUV光刻到2x DRAM及更远

Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program

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