首页> 外文会议>Advances in Electronic Packaging 2005 pt.C >RELIABILITY AND CHARACTERIZATION OF MICRO-PACKAGES IN A WAFER LEVEL AU-SI EUTECTIC VACUUM BONDING PROCESS
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RELIABILITY AND CHARACTERIZATION OF MICRO-PACKAGES IN A WAFER LEVEL AU-SI EUTECTIC VACUUM BONDING PROCESS

机译:晶圆级AU-SI共晶真空键合过程中微包装的可靠性和表征

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A Au-Si eutectic vacuum packaging process was evaluated using high sensitivity poly-Si Pirani vacuum sensors. Encapsulation of devices was achieved by bonding a silicon cap wafer to a device wafer using a Au-Si eutectic solder at above 390 ℃ in a vacuum bonder. The Au-Si eutectic solder encircled the devices, providing an airtight seal. The Pirani gauges were encapsulated and tested over a period of several months in order to determine base pressures and leak/outgassing rates of the micro-cavities. Packaged devices without getters showed initial pressures from 2 to 12 Torr with initial leak/outgassing rates of -0.073 to 80 Torr/year. Using getters, pressures as low as 5 mTorr have been achieved with leak/outgassing rates of <10 mTorr/year. Trends in pressure over time seem to indicate outgassing (desorption of atoms from inside of the microcavity) as the primary mechanism for pressure change over time.
机译:使用高灵敏度多晶硅Pirani真空传感器评估了Au-Si共晶真空包装工艺。器件的封装是通过在390℃以上的真空压焊机中使用Au-Si共晶焊料将硅盖晶片粘合到器件晶片而实现的。 Au-Si共晶焊料环绕器件,提供气密密封。为了确定微腔的基本压力和泄漏/放气速率,对皮拉尼真空计进行了封装和测试,历时数月。没有吸气剂的封装设备显示的初始压力为2到12托,初始泄漏/除气速率为-0.073到80托/年。使用吸气剂,可实现低至5 mTorr的压力,泄漏/除气率<10 mTorr /年。压力随时间的变化趋势似乎表明脱气(原子从微腔内部解吸)是压力随时间变化的主要机制。

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