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A review of wafer bonding materials and characterizations to enable wafer thinning, backside processing, and laser dicing

机译:晶圆键合材料和表征综述,以实现晶圆减薄,背面处理和激光切割

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A wide range of adhesives and coatings has been reported to enable wafer bonding practices that support applications leading to 3-D packaging. These polymeric substances include rosin-urethane [1], silicone [2], rubber [3], and acrylic [4]. In the case of a carrier bonded wafer, the material allows grinding and polishing to ≪20um, protection of the devices from backside processing such as through silicon vias (TSVs) and the associated cleans and metallization steps. In conjunction with laser dicing, the material must be removed from the wafer without residue detection. Proper characterization methods are used to model product qualification during fab integration. For example, thermal tests such as TGA and DSC, may be used to predict pre-processing conditions to improve on-wafer curing [Fig. 1]. Cleaning tests may utilize the extreme sensitivity and delicate contact of the mercury probe analyzer, which has been shown to rapidly characterize film residues at below 10 angstroms [Fig. 2]. Metrology tests include planarization, uniformity as total thickness variation (TTV), contour mapping, stress and/or bow as deviation from reference, and surface roughness. Although all of these measurements may tell a story about a pure material or a smooth wafer, they are especially interesting when their application is applied to model the process. This paper will describe a range of materials currently under evaluation and provide examples of characterization methods and models used to predict issues during integration.
机译:据报道,各种各样的胶粘剂和涂料可以实现晶圆粘合实践,从而支持导致3-D封装的应用。这些聚合物包括松香-氨基甲酸酯[1],硅酮[2],橡胶[3]和丙烯酸[4]。对于采用载体粘结的晶圆,该材料可以进行grinding20um的研磨和抛光,从而保护器件免受诸如硅通孔(TSV)等背面处理以及相关的清洁和金属化步骤的影响。结合激光切割,必须从晶圆上去除材料,而不会发现残留物。正确的表征方法可用于在Fab集成过程中对产品合格性进行建模。例如,诸如TGA和DSC之类的热测试可用于预测预处理条件,以改善晶圆上的固化效果。 1]。清洁测试可以利用汞探针分析仪的极高灵敏度和精细的接触,已证明该技术可以快速表征10埃以下的薄膜残留物[图10]。 2]。计量测试包括平面化,作为总厚度变化(TTV)的均匀性,轮廓映射,作为参考的偏差的应力和/或弯曲度以及表面粗糙度。尽管所有这些测量值都可以讲述纯材料或光滑晶片的故事,但当将其应用程序应用于过程建模时,它们特别有趣。本文将描述当前正在评估的一系列材料,并提供用于预测集成过程中的问题的表征方法和模型的示例。

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