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首页> 外文期刊>Journal of Micromechanics and Microengineering >Ultrashort pulse laser dicing of thin Si wafers: the influence of laser-induced periodic surface structures on the backside breaking strength
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Ultrashort pulse laser dicing of thin Si wafers: the influence of laser-induced periodic surface structures on the backside breaking strength

机译:硅晶片的超短脉冲激光切割:激光诱导的周期性表面结构对背面断裂强度的影响

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摘要

High power electronic chips are usually fabricated on about 50 mu m thin Si wafers to improve heat dissipation. At these chip thicknesses mechanical dicing becomes challenging. Chippings may occur at the cutting edges, which reduce the mechanical stability of the die. Thermal load changes could then lead to sudden chip failure. Ultrashort pulsed lasers are a promising tool to improve the cutting quality, because thermal side effects can be reduced to a minimum. However, laser-induced periodic surface structures occur at the sidewalls and at the trench bottom during scribing. The goal of this study was to investigate the influence of these periodic structures on the backside breaking strength of the die. An ultrafast laser with a pulse duration of 380 fs and a wavelength of 1040 nm was used to cut a wafer into single chips. The pulse energy and the number of scans was varied. The cuts in the wafer were investigated using transmitted light microscopy, the sidewalls of the cut chips were investigated using scanning electron and confocal microscopy, and the breaking strength was evaluated using the 3-point bending test. The results indicated that periodic holes with a distance of about 20-30 mu m were formed at the bottom of the trench, if the number of scans was set too low to completely cut the wafer; the wafer was only perforated. Mechanical breaking of the bridges caused 5 mu m deep kerfs in the sidewall. These kerfs reduced the breaking strength at the backside of the chip to about 300 MPa. As the number of scans was increased, the bridges were ablated and the wafer was cut completely. Periodic structures were observed on the sidewall; the roughness was below 1 mu m. The surface roughness remained on a constant level even when the number of scans was doubled. However, the periodic structures on the sidewall seemed to vanish and the probability to remove local flaws increases with the number of scans. As a consequence, the breaking strength was increased to about 700 MPa.
机译:通常在约50微米的薄Si晶片上制造高功率电子芯片,以改善散热。在这些芯片厚度下,机械切割变得具有挑战性。切屑可能会出现在切削刃处,从而降低模具的机械稳定性。然后,热负载的变化可能导致突然的芯片故障。超短脉冲激光器是提高切割质量的有前途的工具,因为可以将热副作用降至最低。但是,在划线过程中,激光诱导的周期性表面结构出现在侧壁和沟槽底部。这项研究的目的是研究这些周期性结构对模具背面断裂强度的影响。使用脉冲持续时间为380 fs,波长为1040 nm的超快激光器将晶圆切割成单个芯片。脉冲能量和扫描次数是变化的。使用透射光显微镜研究晶片中的切口,使用扫描电子和共聚焦显微镜研究切割的芯片的侧壁,并使用三点弯曲测试评估断裂强度。结果表明,如果将扫描次数设置得太低而无法完全切割晶圆,则在沟槽的底部会形成约20至30微米的周期性孔。晶圆只打了孔。桥的机械断裂导致侧壁上有5微米深的切口。这些切缝将切屑背面的断裂强度降低到约300 MPa。随着扫描次数的增加,桥被烧蚀并且晶片被完全切割。在侧壁上观察到周期性的结构。粗糙度低于1μm。即使扫描次数增加一倍,表面粗糙度仍保持恒定。但是,侧壁上的周期性结构似乎消失了,去除局部缺陷的可能性随着扫描次数的增加而增加。结果,断裂强度增加到约700MPa。

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