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Through Silicon Via(TSV) defect/pinhole self test circuit for 3D-IC

机译:用于3D-IC的硅穿孔(TSV)缺陷/针孔自测电路

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The next generation of ICs will have greater density and speed than that of their predecessors due to the fact that they can be stacked into 3DICs. A common defect in this emerging technology, however, is that pinholes can form during the process of oxide deposition along the Through Silicon Via (TSV) walls. In this paper, four analog test circuits are explored for the purposes of detecting these pinholes. Each of the circuits uses the leakage current from a single PMOS. By using this leakage current to test the resistance between the TSV and ground, one can determine whether there is a pinhole creating a short between the TSV and the substrate.
机译:由于下一代IC可以堆叠到3DIC中,因此密度和速度将比其前代产品大。但是,这种新兴技术的一个共同缺陷是,在沿硅通孔(TSV)壁的氧化物沉积过程中会形成针孔。在本文中,为了检测这些针孔,探索了四个模拟测试电路。每个电路都使用来自单个PMOS的泄漏电流。通过使用该泄漏电流测试TSV与地面之间的电阻,可以确定在TSV与基板之间是否存在造成短路的针孔。

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