首页> 外文会议>2002 International Conference on Modeling and Simulation of Microsystems, Apr 21-25, 2002, San Juan, Puerto Rico, USA >An Investigation on Modeling and Statistical Simulation of SiGe Heterojunction Bipolar Transistors for Characterizing Their Dependence on Germanium Content
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An Investigation on Modeling and Statistical Simulation of SiGe Heterojunction Bipolar Transistors for Characterizing Their Dependence on Germanium Content

机译:SiGe异质结双极晶体管的建模和统计仿真研究,以表征其对锗含量的依赖性

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Although silicon is by far the most widely utilized manufactured semiconductor material, it is very poor in terms of mobilities of holes and electrons, which give rise to unacceptable low operation speeds. Far higher charge-carrier mobilities and saturation velocities have been found in Ⅲ-Ⅴ compound materials, for instance GaAs, AlGaAs, and InP. The project undertaken has utilized a novel methodology to achieve enhanced circuit designs using a multiple statistical simulation approach. This methodology has been described in detail elsewhere. The goal of this project is to extend this methodology to characterize SiGe HBTs and elucidate their dependence on germanium content.
机译:尽管硅是迄今为止使用最广泛的制造半导体材料,但是就空穴和电子的迁移率而言,硅非常差,这导致了不可接受的低操作速度。在Ⅲ-Ⅴ族化合物中,例如GaAs,AlGaAs和InP,发现了更高的载流子迁移率和饱和速度。所进行的项目利用一种新颖的方法,使用多重统计仿真方法来实现增强的电路设计。已经在其他地方详细描述了该方法。该项目的目标是扩展该方法以表征SiGe HBT,并阐明其对锗含量的依赖性。

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