COOLING A RECTANGULAR TARGET PLATE FOR AN APPARATUS FOR CATHODIC SPUTTER COATING

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• 2. 一种平面矩形磁控溅射阴极镀膜均匀性调整装置及方法 [P] . 中国专利： CN108315702B . 2020.01.10
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  机译： 冷却阴极溅射镀膜设备的矩形靶板

• 4. Sputtering equipment for coating large substrates with ferromagnetic and non-magnetic material - has cathode target comprising sub-targets, and cooling plates contg. magnet unit and poles shoes [P] . 德国专利： DE4127261C1 . 1992-06-04

  机译： 用铁磁性和非磁性材料涂覆大型基板的溅射设备-阴极靶（包括子靶）和冷却板（续）。磁铁和极靴

• 5. Rectangular target plate for cathode sputtering apparatus [P] . 美国专利： US4421628A . 1983-12-20

  机译： 阴极溅射装置的矩形靶板

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