Influences of Bias Voltage and Target Current on Structure,Microhardness and Friction Coefficient of Multilayered TiAlN/CrN Coatings Synthesized by Cathodic Arc Plasma Deposition

摘要

Multilayered TiAlN/CrN coatings have been synthesized on stainless steel substrates by cathodic arc plasma deposition using TiAl and Cr targets.Influences of the bias voltage,cathode current ratio ITiAl/ICr,and deposition pressure on the hardness and friction coefficient of the coatings were investigated.The measurement revealed existence of two cubic phases,face-centercubic (Cr,Al)N and(Ti,Al)N,in the coatings deposited under various bias voltages except for the coating deposited at -400 V,which is amorphous.The hardness of the coatings was strongly dependent on the Itial/Icr ratio and deposition pressure,and reached a maximum of 33 GPa at an ITiAl/ICr ratio of 1.0 and a pressure of 1.0 Pa.The incorporation of the element chromium can reduce the density of pinholes in the coatings and assist the optimization of deposition conditions for high quality TiAlN/CrN coatings.