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Sputter coating apparatus - with target exchange chamber capable of being evacuated when target is to be replaced thereby avoiding removal of vacuum in coating chamber
Sputter coating apparatus - with target exchange chamber capable of being evacuated when target is to be replaced thereby avoiding removal of vacuum in coating chamber
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机译:溅射镀膜设备-靶交换室可在更换靶材时排空,从而避免去除镀膜室中的真空
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摘要
Sputter coating apparatus consists of a vacuum chamber (1) in which the coating process takes place and a target exchange chamber which is separated from the vacuum chamber by the target electrode support surface when it is in its raised position. When the target is to be changed, a vacuum is created in the exchange chamber prior to opening the separation wall as the target electrode is lowered. USE/ADVANTAGE - The target can be frequently changed without removing the vacuum in the sputter chamber. There is no new start-up time required.
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