WAFER CHUCK FOR SILICON WET ETCHING TO FABRICATE X-RAY MASK

摘要

The present invention relates to a wafer chuck for silicon wet etching for fabricating an X-ray mask.;More specifically, the present invention can prevent the outer periphery of the wafer from contacting the etchant during wet etching of the silicon during the X-ray mask fabrication process, or prevent the device mounted on one side of the wafer from contacting the etchant. A wafer chuck for silicon wet etching.;The silicon wet etching wafer chuck of the present invention is a silicon wet etching wafer chuck for X-ray mask fabrication, having an annular shape bent in an L shape at a cross section and having an O-ring (11) in the center of the bent flat surface. A lower support portion 10 for laying the outer peripheral portion of one surface of the wafer 50; And, when having an annular shape O-ring (21) is placed in the center and is installed on the bent surface of the lower support 10, the upper support 20 for fixing the outer peripheral portion of the other surface of the wafer 50 It is characterized by including.