PHASE SHIFT MASK, METHOD OF MANUFACTURING THE PHASE SHIFT MASK, AND EXPOSURE METHOD USING THE PHASE SHIFT MASK

摘要

PROBLEM TO BE SOLVED: To provide a phase shift mask which is capable of easily forming desired pattern shapes, a method of manufacturing the phase shift mask and an exposure method using the phase shift mask. SOLUTION: A quartz substrate 1 has first light transparent parts 1a and second light transparent parts 1b allowing the transmission of exposure light. The first and second light transparent parts 1a and 1b are so constituted that the phases of the exposure light allowing the transmission of both are changed 180 deg.C from each other. Semi-light shielding films 3 exist between the first and second light transparent parts 1a and 1b and are formed in partial regions of the first and second light transparent parts 1a and 1b. The semi-light shielding films 3 have the transmittance of 3 to 30%.