Development of a Bright Peak Enhanced X-Ray Phase Shifting Mask BPEXPM

摘要

Under a separate DARPA grant, the Center for NanoTechnology (CNTech) had developed and patented (Yang, Lei, Taylor, J.W., and Cerrina, F., 'Enhanced Bright Peak Clear Phase Shifting Mask and Methods of Use', U.S. Patent 6,428, 939, August 6, 2002, application filed 03/22/01) the concept of using a clear phase X-ray mask called the Bright Peak Enhanced X-ray Phase Mask (BPEXPM) to produce reduced features on the wafer from larger features on the mask.