首页> 外文OA文献 >New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout

【2h】

New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout

机译：用于双重曝光，明场交替相移掩模版图的新图形二等分

页面导航

著录项
相似文献
相关主题

著录项

作者
Andrew B. Kahng; Shailesh Vaya; Er Zelikovsky;
展开▼
作者单位

展开▼
年度 2013
总页数
原文格式 PDF
正文语种
中图分类
入库时间 2022-08-20 20:56:44

相似文献

外文文献
中文文献
专利

1. Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP) [J] . H.Y. Jung, Y.R. Park, H.J. Lee, Thin Solid Films . 2009,第14期

机译：使用感应耦合等离子体（ICP）的极紫外蚀刻（EUVL）的交替相移掩模（PSM）结构的高度选择性干法蚀刻
2. Optimal phase conflict removal for layout of dark field alternating phase shifting masks [J] . Berman P., Kahng A.B. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems . 2000,第2期

机译：用于暗场交替相移掩模布局的最佳相位冲突消除
3. Application of an Alternating Phase-Shifting Mask Design Method to Near-Field Photolithography for Fabricating More Than 2 GHz SAW Devices [J] . Fu-Der Lai, Jui-Ming Hua, Hao-Min Huang IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control . 2007,第10期

机译：交替相移掩模设计方法在制造2 GHz以上声表面波器件的近场光刻中的应用
4. New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout [C] . Andrew B. Kahng, Shailesh Vaya, Alexander Zelikovsky, Asia and South Pacific Design Automation Conference . 2001

机译：用于双重曝光，明场交替相移掩模版图的新图形二等分
5. Computer-aided mask layout synthesis for anisotropic etch photolithography. [D] . Long, Mark K. 1999

机译：用于各向异性蚀刻光刻的计算机辅助掩模版图合成。
6. Bright-field holography: cross-modality deep learning enables snapshot 3D imaging with bright-field contrast using a single hologram [O] . Yichen Wu, Yilin Luo, Gunvant Chaudhari, 2019

机译：明场全息图：跨模态深度学习可使用单个全息图实现具有明场对比度的快照3D成像
7. New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout [O] . Andrew B. Kahng, Shailesh Vaya, Alexander Zelikovsky 2001

机译：用于双重曝光，明场交替相移掩模版图的新图形二等分
8. Infrared Frequency Selective Surfaces Fabricated using Optical Lithography and Phase-Shift Masks [R] . Spector, S. J., Astolfi, D. K., Doran, S. P., 2001

机译：使用光学光刻和相移掩模制造的红外频率选择表面

New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout

著录项

相似文献

相关主题

期刊订阅