相移掩模保护膜残留胶清洗方式研究

摘要

Phase shift mask in fab need to go back to mask shop to re-mount pellicle because of the pellicle destroyed or mask haze. The mask need to take off pellicle and clean before re-mount pellicle. SPM clean recipe is the traditional recipe. SPM for Phase shift mask is very easy to bring SO4- residual, then take the haze to mask. The optimization recipe has been found after some different experiment in this paper.%相移掩模（Phase Shift Mask）在实际使用过程中,往往会因为保护膜沾污、损坏或者因为掩模结晶（Haze）等问题需要返回掩模工厂进行重新贴膜。重新贴膜时需要先去除保护膜并清洗。传统的清洗方式是采用硫酸＋双氧水（SPM）来进行清洗。不过对于相移掩模来说,SPM清洗方式容易造成硫酸根残留,进而造成产品Haze问题,影响产品使用。通过采用不同的清洗方法进行对比和优化实验,找出了最佳的非SPM方式去除保护膜残留胶的方法。