SEMICONDUCTOR DEVICE, ITS MANUFACTURING METHOD, AND RETICULE

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor device capable of easily grasping the size of a resist pattern by an optical proximity effect even when the code pattern arrangement of a mask ROM is especially diversified and the number of code data of a cell part is enormously increased, a method for manufacturing the semiconductor device and a reticule. SOLUTION: A 7-points adjacent code pattern layer 23G and 8-points adjacent code pattern layer 23H of element patterns whose size dispersion due to the optical proximity effect is predicted out of code pattern layers to be element patterns formed in a ROM code area (main cell area) 20 are extracted, 7-points adjacent point measuring pattern layer 33G and 8-points adjacent point measuring pattern layer 33H having the same peripheral pattern arrangement are formed in a size measuring pattern arrangement area 30 to measure the size of the measuring pattern layers 33G, 33H.