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Retaining ring with trigger for chemical mechanical polishing apparatus
Retaining ring with trigger for chemical mechanical polishing apparatus
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机译:带有触发器的固定环,用于化学机械抛光设备
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摘要
A retaining ring for chemical mechanical polishing (CMP) apparatus comprising a body of the retaining ring, and a single trigger cavity, or a plurality of trigger cavities. Each trigger cavity formed inside the body of the retaining ring is filed with gas or fluid, and is configured to indicate that thickness of the retaining ring is less than or equal to a predetermined thickness threshold.
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