A CHEMICAL MECHANICAL POLISHING APPARATUS, A CARRIER HEAD FOR THE CHEMICAL MECHANICAL POLISHING APPARATUS, RETAINING RING FOR THE CARRIER HEAD, AND METHOD FOR THE CHEMICAL MECHANICAL POLISHING APPARATUS

摘要

The disclosure relates to a carrier head of a chemical mechanical polishing apparatus to apply and distribute a polishing slurry to a polishing pad. The carrier head includes a retaining ring (110) having a trough for holding a supply of polishing slurry and one or more channels (132) to channel the polishing slurry to the polishing pad (32). IMAGE