RETAINING RING FOR CHEMICAL MECHANICAL POLISHING PROCESS, METHOD FOR THE MANUFACTURE THEREOF, AND CHEMICAL MECHANICAL POLISHING SYSTEM INCLUDING THE RETAINING RING

摘要

A retaining ring for use in a chemical mechanical polishing process includes an annular metal backbone, a lower portion, and an upper portion. The lower portion has a bottom surface for contacting a polishing pad during the chemical manufacturing polishing process where the lower portion includes a poly(etherimide), or a combination of a poly(etherimide) and a poly(aromatic ketone). The upper portion includes a thermoplastic polymer. The annular metal backbone is positioned between the lower portion and the upper portion. Methods for the manufacture of the retaining ring are also described.