HIGH PURITY NICKEL/VANADIUM SPUTTERING COMPONENTS;GUO WEI AND METHODS OF MAKING SPUTTERING COMPONENTS

摘要

The invention includes sputtering components, such as sputtering targets, comprising high-purity Ni-V. The sputtering components can have a fine average grain size throughout, with an exemplary fine average grain size being a grain size less than or equal to 40 microns. The invention also includes methods of making high- purity Ni-V structures.