首页>
外国专利>
HIGH PURITY NICKEL/VANADIUM SPUTTERING COMPONENTS; AND METHODS OF MAKING SPUTTERING COMPONENTS
HIGH PURITY NICKEL/VANADIUM SPUTTERING COMPONENTS; AND METHODS OF MAKING SPUTTERING COMPONENTS
展开▼
机译:高纯镍/钒溅射成分;和制造溅射成分的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The invention includes sputtering components, such as sputtering targets, comprising high-purity Ni-V. The sputtering components can have a fine average grain size throughout, with an exemplary fine average grain size being a grain size less than or equal to 40 microns. The invention also includes methods of making high-purity Ni-V structures.
展开▼