HIGH PURITY NICKEL/VANADIUM SPUTTERING COMPONENTS; AND METHODS OF MAKING SPUTTERING COMPONENTS

摘要

The present invention includes sputtered component, such as sputtering target, includes high-purity N i-V. The sputtering components have fine average particle size particle size everywhere, and 40 microns of typical fine average particle size particle size is less than or equal to particle size. The present invention also includes the method for method preparation high-purity N i-V structures.