The present invention for forming an optical thin film to change to match the optical properties such as reflectance transmittance, particularly, by using a sputtering vapor deposition apparatus relates to a manufacturing apparatus and method and an optical thin film of the optical thin film using a sputtering method on the object, is installed on the center side of the sputtering chamber (not shown) with which the rotation center shaft 10; Rotary panel 20 is installed rotating on the central shaft (10) and; Interlocking connection to the central shaft 10, shaft 30 and; The rotary panel is installed on a side edge surface of glass 40 to be rotated are connected to the connecting shaft 30, and the material is deposited mounting shaft 50 which is attached to the surface of portion 20; High refractive cathode which face each other with the center position of the center axis 10 to the outer side of the rotation panel (20) (Cathode: 60) and the low refractive cathode: is configured to include a (Cathode 70), the conventional electron beam increase productivity than the method according to the deposition apparatus and, to a thin film to have a strong attractive force.
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