首页> 外国专利> SOURCE MATERIAL FOR MANUFACTURING SINGLE CRYSTAL SiC, METHOD FOR MANUFACTURING THE SAME, METHOD FOR MANUFACTURING SINGLE CRYSTAL SiC USING THE SOURCE MATERIAL, AND SINGLE CRYSTAL SiC OBTAINED BY THE METHOD

SOURCE MATERIAL FOR MANUFACTURING SINGLE CRYSTAL SiC, METHOD FOR MANUFACTURING THE SAME, METHOD FOR MANUFACTURING SINGLE CRYSTAL SiC USING THE SOURCE MATERIAL, AND SINGLE CRYSTAL SiC OBTAINED BY THE METHOD

机译:用于制造单晶SiC的原料,用于制造单晶SiC的方法,使用该原料制造单晶SiC的方法以及通过该方法获得的单晶SiC

摘要

PROBLEM TO BE SOLVED: To provide a source material for manufacturing single crystal SiC and a method for manufacturing the source material that can be smoothly transported onto an SiC seed single crystal without clogging, and to provide a method for epitaxially growing high-quality single crystal SiC by using the source material, and high-quality single crystal SiC obtained by the method.;SOLUTION: The source material for manufacturing single crystal SiC consists of secondary particles substantially comprising primary particles of each of silica and carbon and having substantially a spherical form of the secondary particles with diameters of 1 to 90 μm. The method for manufacturing the source material for manufacturing single crystal SiC includes a step of producing slurry comprising silica particles, carbon particles and a solvent and a spray-drying step of manufacturing secondary particles containing silica and carbon by spray-drying and granulating the slurry in a vaporizing device.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种用于制造单晶SiC的原材料以及一种可以平滑地运输到SiC籽晶单晶而不堵塞的原材料的制造方法,并且提供一种用于外延生长高质量单晶的方法。通过使用该源材料的SiC以及通过该方法获得的高质量单晶SiC;解决方案:用于制造单晶SiC的源材料由基本上包含二氧化硅和碳各自的初级颗粒并且基本上呈球形的次级颗粒组成。直径为1至90μm的次级颗粒的一半。用于制造单晶SiC的原料的制造方法包括以下步骤:制造包含二氧化硅颗粒,碳颗粒和溶剂的浆料;以及喷雾干燥步骤,通过将浆料喷雾干燥并造粒来制造包含二氧化硅和碳的二次颗粒。蒸发装置。;版权所有:(C)2008,日本特许厅&INPIT

著录项

  • 公开/公告号JP2008037720A

    专利类型

  • 公开/公告日2008-02-21

    原文格式PDF

  • 申请/专利权人 SHIN ETSU CHEM CO LTD;

    申请/专利号JP20060216748

  • 发明设计人 IKARI MASANORI;ABE TAKAO;KANENIWA TORU;

    申请日2006-08-09

  • 分类号C30B29/36;C30B1/10;H01L33/00;

  • 国家 JP

  • 入库时间 2022-08-21 20:23:05

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