首页> 外国专利> IMPROVED FILL MATERIAL FOR DUAL DAMASCENE PROCESSES

IMPROVED FILL MATERIAL FOR DUAL DAMASCENE PROCESSES

机译:改进了双镶嵌工艺的填充材料

摘要

A via and contact hole fill composition and method for using the composition in the dual damascene production of circuits is provided. Broadly, the fill compositions include a quantity of solid components including a polymer binder and a solvent system for the solid components. The boiling point of the solvent system is less than the cross-linking temperature of the composition. Preferred solvents for use in the solvent system include those selected from the group consisting of alcohols, ethers, glycol ethers, amides, ketones, and mixtures thereof. Preferred polymer binders are those having an aliphatic backbone and a molecular weight of less than about 80,000, with polyesters being particularly preferred. In use, the fill composition is applied to the substrate surfaces forming the contact or via holes as well as to the substrate surfaces surrounding the holes, followed by heating to the composition reflow temperature so as to cause the composition to uniformly flow into and cover the hole-forming surfaces and substrate surfaces. The composition is then cured, and the remainder of the dual damascene process is carried out.
机译:提供了通孔和接触孔填充组合物以及用于在电路的双镶嵌生产中使用该组合物的方法。广泛地,填充组合物包括一定量的固体组分,包括聚合物粘合剂和用于固体组分的溶剂体系。溶剂体系的沸点小于组合物的交联温度。用于溶剂系统的优选溶剂包括选自醇,醚,二醇醚,酰胺,酮及其混合物的那些。优选的聚合物粘合剂是具有脂族主链且分子量小于约80,000的那些,特别优选聚酯。在使用中,将填充组合物施加到形成接触孔或通孔的基底表面以及孔周围的基底表面,然后加热到组合物的回流温度,以使组合物均匀地流入并覆盖该孔。孔形成表面和基底表面。然后将组合物固化,并进行双镶嵌工艺的其余部分。

著录项

  • 公开/公告号EP1212788A4

    专利类型

  • 公开/公告日2008-04-16

    原文格式PDF

  • 申请/专利权人 BREWER SCIENCE;

    申请/专利号EP20000955751

  • 发明设计人 LAMB JAMES E. III;SHAO XIE;

    申请日2000-08-17

  • 分类号H01L21/302;H01L21/312;H01L21/47;H01L21/66;

  • 国家 EP

  • 入库时间 2022-08-21 19:59:42

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