首页> 外国专利> ALKALI-SOLUBLE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY BODY DEVICE USING THE CURED FILM

ALKALI-SOLUBLE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY BODY DEVICE USING THE CURED FILM

机译:碱溶性树脂,正性光敏树脂组成,固化膜,保护膜,绝缘膜以及使用该固化膜的半导体器件和显示体器件

摘要

PROBLEM TO BE SOLVED: To provide an alkali-soluble resin having high sensitivity, and having excellent heat resistance and reliability even when cured at low temperature when used as a positive photosensitive resin composition, to provide the positive photosensitive resin composition having high sensitivity, and having excellent heat resistance and reliability even when cured at low temperature, and to provide a cured film and the like, and a semiconductor device and the like using the cured film.;SOLUTION: The alkali-soluble resin contains a polybenzoxazole precursor structure constituted of a bis(aminophenol) and a structure originating from dicarboxylic acid. The difference is 37 [kcal/mol] or more between heat of formation of the most stable structure and heat of formation of the most unstable structure which are calculated and obtained by calculation chemistry when two aromatic rings of the bis(aminophenol) are rotated.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种碱溶性树脂,该碱溶性树脂具有高灵敏度,并且当用作正型光敏树脂组合物时即使在低温下固化也具有优异的耐热性和可靠性,从而提供具有高灵敏度的正型光敏树脂组合物,具有优异的耐热性和可靠性,即使在低温下固化,也能提供固化膜等,以及使用该固化膜的半导体器件等。解决方案:碱溶性树脂含有由双(氨基酚)和源自二羧酸的结构。当双(氨基酚)的两个芳环旋转时,通过计算化学计算和获得的最稳定结构的形成热和最不稳定结构的形成热之间的差为37 [kcal / mol]或更大。 ;版权:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP2009155481A

    专利类型

  • 公开/公告日2009-07-16

    原文格式PDF

  • 申请/专利权人 SUMITOMO BAKELITE CO LTD;

    申请/专利号JP20070335490

  • 发明设计人 TERAYAMA MIKI;TERAKAWA KOJI;

    申请日2007-12-27

  • 分类号C08G73/06;G03F7/023;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 19:45:47

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