Substrate heating chamber and the substrate processing apparatus for information recording disk with this substrate heating chamber, and substrate heating apparatus

摘要

PROBLEM TO BE SOLVED: To execute heating treatment with high plane temperature uniformity or execute heating while a temperature gradient is intentionally formed to various substrates of different sizes. ;SOLUTION: In a chamber body 31, a substrate holder 90 holds a disklike substrate 9 so as to abute on the periphery of the substrate 9, and the substrate 9 is heated by radiation rays from an annular radiation heating source 33 arranged coaxially with the substrate 9. A cylindrical ambient shielding tool 34 corresponding to the shape on the lower side cut at a vertical face with a conical shape as an axis is provided coaxially with the substrate 9 and shields radiation rays to the region around the substrate 9. The ridgeline of the ambient shielding tool 34 is crossed with the periphery of the substrate 9, and moreover, a position controlling mechanism for ambiences dislocates the ambient shielding tool 34 in the axial direction. A disklike central shielding tool 36 provided on the space between the radiation heating source 33 and the substrate 9 shields radiation rays to the central part of the substrate 9 and is also dislocated in the axial direction by a positioning controlling mechanism for centers.;COPYRIGHT: (C)2001,JPO