A novel apparatus for the uniform heating of substrates during post expose bake

摘要

It is well known that the use of Chemically Activated Resists (CAR) or Chemically Enhanced Resists (CER) require that the Post Expose Bake be extremely uniform at temperature ramp and at the steady state as Critical Dimension control is strongly dependent upon bake temperature. A novel, simple and robust method of obtaining near perfect bake temperature uniformity and the enhanced results obtained thereby are discussed.