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SUBSTRATE HEATING CHAMBER AND SUBSTRATE TREATING DEVICE FOR INFORMATION RECORDING DISK PROVIDED WITH THE SUBSTRATE HEATING CHAMBER
SUBSTRATE HEATING CHAMBER AND SUBSTRATE TREATING DEVICE FOR INFORMATION RECORDING DISK PROVIDED WITH THE SUBSTRATE HEATING CHAMBER
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机译:用于由基质加热室提供的信息记录盘的基质加热室和基质处理设备
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摘要
PROBLEM TO BE SOLVED: To execute heating treatment with high plane temperature uniformity or execute heating while a temperature gradient is intentionally formed to various substrates of different sizes. ;SOLUTION: In a chamber body 31, a substrate holder 90 holds a disklike substrate 9 so as to abute on the periphery of the substrate 9, and the substrate 9 is heated by radiation rays from an annular radiation heating source 33 arranged coaxially with the substrate 9. A cylindrical ambient shielding tool 34 corresponding to the shape on the lower side cut at a vertical face with a conical shape as an axis is provided coaxially with the substrate 9 and shields radiation rays to the region around the substrate 9. The ridgeline of the ambient shielding tool 34 is crossed with the periphery of the substrate 9, and moreover, a position controlling mechanism for ambiences dislocates the ambient shielding tool 34 in the axial direction. A disklike central shielding tool 36 provided on the space between the radiation heating source 33 and the substrate 9 shields radiation rays to the central part of the substrate 9 and is also dislocated in the axial direction by a positioning controlling mechanism for centers.;COPYRIGHT: (C)2001,JPO
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