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METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GATE OF DEVICE FOR RESIN-SEALING SURFACE OF SEMICONDUCTOR WAFER
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GATE OF DEVICE FOR RESIN-SEALING SURFACE OF SEMICONDUCTOR WAFER
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机译:半导体晶片的树脂密封面的半导体装置的制造方法及装置的浇口
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摘要
PROBLEM TO BE SOLVED: To reduce the damage to a semiconductor wafer to the utmost by reducing the force applied to the semiconductor wafer to the utmost in a process for mounting the semiconductor wafer in a mold to seal the surface of the wafer with a resin.;SOLUTION: An impact relaxing means for reducing the force applied to the semiconductor wafer is provided under a lower mold.;COPYRIGHT: (C)2002,JPO
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