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METHOD FOR INTEGRATION OF REPLACEMENT GATE IN CMOS FLOW
METHOD FOR INTEGRATION OF REPLACEMENT GATE IN CMOS FLOW
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机译:在CMOS流中集成替换门的方法
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摘要
Semiconductor devices and fabrication methods are provided, in which metal transistor replacement gates are provided for CMOS transistors. The process provides dual or differentiated work function capability (e.g., for PMOS and NMOS transistors) in CMOS processes.
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