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LDMOS with self aligned vertical LDD backside drain

机译:具有自对准垂直LDD背面漏极的LDMOS

摘要

A field effect transistor includes a semiconductor region of a first conductivity type having an upper surface and a lower surface, the lower surface of the semiconductor region extending over and abutting a substrate. A well regions of a second conductivity type is disposed within the semiconductor region. The field effect transistor also includes source regions of the first conductivity type disposed in the well regions and a gate electrode extending over each well region and overlapping a corresponding one of the source regions. Each gate electrode is insulated from the underlying well region by a gate dielectric. At least one LDD region of the first conductivity type is disposed in the semiconductor region between every two adjacent well regions such that the at least one LDD region is in contact with the two adjacent well regions between which it is disposed. A sinker region is disposed in the semiconductor region directly underneath the at least one LDD region such that the at least one LDD region and the sinker region are positioned along a vertical orientation between the upper and lower surfaces of the semiconductor region.
机译:场效应晶体管包括具有上表面和下表面的第一导电类型的半导体区域,该半导体区域的下表面在衬底上方延伸并邻接衬底。第二导电类型的阱区域设置在半导体区域内。场效应晶体管还包括设置在阱区域中的第一导电类型的源极区域以及在每个阱区域上延伸并且与相应的一个源极区域重叠的栅电极。每个栅电极通过栅电介质与下面的阱区绝缘。第一导电类型的至少一个LDD区域设置在每两个相邻的阱区域之间的半导体区域中,使得至少一个LDD区域与在其之间设置的两个相邻的阱区域接触。在半导体区域中,在至少一个LDD区域的正下方设置有下沉区域,使得至少一个LDD区域和下沉区域沿着垂直方向位于半导体区域的上表面和下表面之间。

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