Atmospheric Plasma Etching Device for Opening Of Pad Region On TFT Substrate, And Plasma Etching Method Using The Same

摘要

PURPOSE: An atmospheric plasma etching device for opening the pad region of a TFT substrate and plasma etching method using the same are provided to open the pad region of the TFT substrate without an expensive photo process, thereby saving manufacturing costs. CONSTITUTION: A plasma generating unit(200) comprises an electrode module(210) including an anode(210-1) and a cathode(210-2). A slit hole(211) for spraying plasma flame to the pad region of a TFT substrate(100) is formed on the anode. An etching unit(300) comprises an exhaustion adjusting module(320). A sample transfer module(310) includes an align device(312) which matches the pad region of a substrate on a stage with the slit hole. The etching unit is located on the plasma generating unit.