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Method for transferring a layer from a donor substrate onto a handle substrate
Method for transferring a layer from a donor substrate onto a handle substrate
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机译:将层从供体衬底转移到处理衬底上的方法
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摘要
The invention relates to a method for transferring a layer from a donor substrate onto a handle substrate wherein, after detachment, the remainder of the donor substrate is reused. To get rid of undesired protruding edge regions that are due to the chamfered geometry of the substrates, the invention proposes to carry out an additional etching process before detachment occurs.
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