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Metal-oxide-based conductive-bridging random access memory (CBRAM) having the solid electrolyte doped with a second metal

机译:固体电解质掺杂有第二种金属的基于金属氧化物的导电桥随机存取存储器(CBRAM)

摘要

A resistive random access memory device includes a first electrode made of inert material; a second electrode made of soluble material, and a solid electrolyte, the first and second electrodes being respectively in contact with one of the faces of the electrolyte, the second electrode to supply mobile ions circulating in the solid electrolyte to the first electrode to form a conductive filament between the first and second electrodes when a voltage is applied between the first and second electrodes, the solid electrolyte including a region made of a first metal oxide that is doped by a second metal, distinct from the first metal and able to form a second metal oxide, the second metal selected such that the first metal oxide doped by the second metal has a band gap energy less than or equal to that of the first metal oxide not doped by the second metal.
机译:电阻式随机存取存储装置包括:惰性材料制成的第一电极;由可溶材料制成的第二电极和固体电解质,所述第一和第二电极分别与所述电解质的一个面接触,所述第二电极将在所述固体电解质中循环的移动离子提供给所述第一电极以形成当在第一电极和第二电极之间施加电压时,在第一电极和第二电极之间具有导电丝,固体电解质包括由第一金属氧化物制成的区域,该区域由第二金属掺杂,与第一金属不同并且能够形成第二金属氧化物,第二金属被选择成使得被第二金属掺杂的第一金属氧化物的带隙能量小于或等于未被第二金属掺杂的第一金属氧化物的带隙能量。

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