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Bipolar resistive switching characteristics of tungsten-doped indium-zinc oxide conductive-bridging random access memory

机译:钨掺杂铟 - 氧化锌导电桥接随机存取存储器的双极电阻切换特性

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摘要

The purpose of this work is to develop a reliable amorphous tungsten-doped indium-zinc oxide based conductive-bridging random access memory (CBRAM). The device with Cu/TiW/InWZnO/Pt structure exhibits stable bipolar resistive switching behavior. The device also shows good non-volatile memory characteristics, such as low operation voltage, on/off resistance ratio (similar to 10(2)), high switching endurance (more than 5 x 10(2) cycles). The temperature coefficient of resistance in the conductive filament confirms that an electro-chemical metallization (ECM) based conduction is observed in the InWZnO device. Furthermore, the temperature retention characteristics and the current transport mechanisms are also investigated. According to our experiments, we propose a model to explain the resistive switching phenomenon observed in our devices. These results have given a great potential for the transparent amorphous oxide semiconductor (TAOS)-based material utilizing in CBRAM stacks and integrating into the display circuits for future memory-in-pixel applications.
机译:这项工作的目的是开发一种可靠的无定形钨掺杂铟 - 氧化锌的导电桥接随机存取存储器(CBRAM)。具有Cu / TiW / INWZNO / PT结构的装置表现出稳定的双极电阻切换行为。该装置还显示出良好的非易失性存储器特性,例如低运行电压,开/关电阻比(类似于10(2)),开关耐久性高(超过5×10(2)个循环)。导电灯丝中的电阻温度系数证实了在欧语装置中观察到基于电化金属化(ECM)的导通。此外,还研究了温度保持特性和电流传输机制。根据我们的实验,我们提出了一种模型来解释在我们的设备中观察到的电阻转换现象。这些结果具有透明非晶氧化物半导体(TaOS)基于CBRAM堆叠的材料的巨大潜力,并将其集成到用于未来的存储器内应用程序的显示电路中。

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