首页> 外国专利> SWITCHING DEVICE SWITCHING DEVICE ARRAY RESISTIVE RANDOM ACCESS MEMORY METHOD OF FABRICATING SWITCHING DEVICE SWITCHING DEVICE ARRAY AND RESISTIVE RANDOM ACCESS MEMORY

SWITCHING DEVICE SWITCHING DEVICE ARRAY RESISTIVE RANDOM ACCESS MEMORY METHOD OF FABRICATING SWITCHING DEVICE SWITCHING DEVICE ARRAY AND RESISTIVE RANDOM ACCESS MEMORY

机译:开关设备开关设备阵列电阻随机访问存储器的制造方法开关设备开关设备阵列和电阻随机访问存储器的制造方法

摘要

In a method for manufacturing a switching device according to an embodiment of the present invention, a first electrode material film and an insulating material film are sequentially formed on a substrate. A doping mask pattern layer is formed on the insulating material film, and the doping mask pattern layer exposes a part of a pillar structure forming region on the insulating material film. A dopant is implanted into the inside of the insulating material film exposed by the doping mask pattern layer. The doping mask pattern layer is removed. A second electrode material film is formed on the insulating material film. The second electrode material film, the insulating material film, and the first electrode material film are patterned on the substrate to form a pillar structure including a second electrode layer, an insulating layer, and a first electrode layer. At this time, a threshold switching operation is performed in a region doped with the dopant in the insulating layer. Accordingly, the present invention can control the size of a threshold switching operation region in the switching device.
机译:在根据本发明实施例的开关装置的制造方法中,第一电极材料膜和绝缘材料膜顺序地形成在基板上。掺杂掩模图案层形成在绝缘材料膜上,并且掺杂掩模图案层暴露绝缘材料膜上的柱状结构形成区域的一部分。将掺杂剂注入到由掺杂掩模图案层暴露的绝缘材料膜的内部。去除掺杂掩模图案层。在绝缘材料膜上形成第二电极材料膜。在基板上对第二电极材料膜,绝缘材料膜和第一电极材料膜进行构图,以形成包括第二电极层,绝缘层和第一电极层的柱状结构。此时,在绝缘层中掺杂有掺杂剂的区域中执行阈值切换操作。因此,本发明可以控制开关装置中的阈值开关操作区域的尺寸。

著录项

  • 公开/公告号KR20170102732A

    专利类型

  • 公开/公告日2017-09-12

    原文格式PDF

  • 申请/专利权人 SK HYNIX INC.;

    申请/专利号KR20160025230

  • 发明设计人 LEE JAE YEON;

    申请日2016-03-02

  • 分类号H01L45;

  • 国家 KR

  • 入库时间 2022-08-21 13:26:39

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