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Super-junction trench MOSFETs with closed cell layout having shielded gate

机译:具有闭合单元布局且具有屏蔽栅极的超结沟槽MOSFET

摘要

A super-junction trench MOSFET with closed cell layout having shielded gate is disclosed, wherein closed gate trenches surrounding a deep trench in each unit cell and the shielded gate disposed in the deep trench. Trenched source-body contacts are at least formed between the closed gate trenches and the deep trench. The deep trench has square, rectangular, circle or hexagon shape.
机译:公开了一种具有封闭单元布局的具有屏蔽栅的超结沟槽MOSFET,其中,封闭栅沟槽围绕每个单位单元中的深沟槽,而屏蔽栅置于深沟槽中。在封闭的栅极沟槽和深沟槽之间至少形成沟槽的源极-本体接触。深沟槽具有正方形,矩形,圆形或六边形形状。

著录项

  • 公开/公告号US9412810B2

    专利类型

  • 公开/公告日2016-08-09

    原文格式PDF

  • 申请/专利权人 FORCE MOS TECHNOLOGY CO. LTD.;

    申请/专利号US201514592223

  • 发明设计人 FU-YUAN HSIEH;

    申请日2015-01-08

  • 分类号H01L29/06;H01L29/78;H01L29/423;H01L29/10;H01L29/49;H01L29/417;H01L23/535;

  • 国家 US

  • 入库时间 2022-08-21 14:28:33

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