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Apparatuses having a ferroelectric field-effect transistor memory array and related method

机译:具有铁电场效应晶体管存储器阵列的设备和相关方法

摘要

An apparatus comprises field-effect transistor (FET) structures stacked horizontally and vertically in a three-dimensional memory array architecture, gates extending vertically and spaced horizontally between the plurality of FET structures, and a ferroelectric material separating the FET structures and the gates. Individual ferroelectric FETs (FeFETs) are formed at intersections of the FET structures, the gates, and the ferroelectric material. Another apparatus comprises a plurality of bit lines and word lines. Each bit line has at least two sides that are coupled with a ferroelectric material such that each bit line is shared by neighboring gates to faun a plurality of FeFETs. A method of operating a memory array comprises applying a combination of voltages to a plurality of word lines and digit lines for a desired operation for a plurality of FeFET memory cells, at least one digit line having plurality of FeFET memory cells accessible by neighboring gates.
机译:一种设备,包括在三维存储器阵列架构中水平和垂直堆叠的场效应晶体管(FET)结构,在多个FET结构之间垂直延伸并水平间隔的栅极以及将FET结构和栅极分开的铁电材料。单独的铁电FET(FeFET)形成在FET结构,栅极和铁电材料的相交处。另一设备包括多条位线和字线。每条位线具有至少两个与铁电材料耦合的侧面,使得每条位线被相邻的栅极共享以形成多个FeFET。一种用于操作存储器阵列的方法,包括将电压的组合施加到多个字线和数字线,以用于多个FeFET存储器单元的期望操作,至少一个数字线具有可由相邻栅极访问的多个FeFET存储器单元。

著录项

  • 公开/公告号US9281044B2

    专利类型

  • 公开/公告日2016-03-08

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;

    申请/专利号US201313897037

  • 发明设计人 D. V. NIRMAL RAMASWAMY;ADAM D. JOHNSON;

    申请日2013-05-17

  • 分类号G11C11/22;

  • 国家 US

  • 入库时间 2022-08-21 14:27:54

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