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ROLL-TO-ROLL TYPE VACUUM DEPOSITION SYSTEM AND VACUUM DEPOSITION METHOD

机译:卷对卷式真空沉积系统和真空沉积方法

摘要

PROBLEM TO BE SOLVED: To provide a vacuum deposition method capable of securely reducing a splash and also suppressing a deposition material from decreasing in effective use rate, and a vacuum deposition device capable of implementing the same.;SOLUTION: The present invention relates to a roll-to-roll type vacuum deposition device 10 comprising: an evaporation source 1 for generating a vacuum deposition flux 3 by evaporating a vacuum deposition material; a film formation roller 4 supporting a base material film 8 and receiving the vacuum deposition flux 3 thereupon to form a thin film; and a shield plate 6 for blocking part of the vacuum deposition flux 3 between the evaporation source 1 and the film formation roller 4, the roll-to-roll type vacuum deposition device 10 being characterized in that the evaporation source 1 is installed at evaporation source driving means 2 of driving the evaporation source 1 and varying the distance to the film formation roller 4, and the shield plate 6 is installed at shield plate driving means 7 of driving the shield plate 6 and varying the area by which the vacuum deposition flux is blocked.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2017,JPO&INPIT
机译:解决的问题:提供一种能够可靠地减少飞溅并且还抑制沉积材料的有效使用率降低的真空沉积方法,以及能够实现该真空沉积方法的真空沉积装置。卷对卷型真空沉积装置10包括:蒸发源1,用于通过蒸发真空沉积材料来产生真空沉积通量3;和膜形成辊4,其支撑基材膜8并在其上接收真空沉积通量3以形成薄膜;卷对卷式真空沉积装置10的特征在于,蒸发源1安装在蒸发源上,并且屏蔽板6用于阻挡部分真空沉积通量3在蒸发源1和成膜辊4之间。驱动蒸发源1并改变到成膜辊4的距离的驱动装置2,并且将屏蔽板6安装在驱动屏蔽板6并改变真空沉积通量的面积的屏蔽板驱动装置7上。 ;选定的图纸:图1;版权:(C)2017,JPO&INPIT

著录项

  • 公开/公告号JP2017043799A

    专利类型

  • 公开/公告日2017-03-02

    原文格式PDF

  • 申请/专利权人 TOPPAN PRINTING CO LTD;

    申请/专利号JP20150165802

  • 发明设计人 ISHIKAWA YOSHIHIRO;

    申请日2015-08-25

  • 分类号C23C14/24;C23C14/56;

  • 国家 JP

  • 入库时间 2022-08-21 14:00:10

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