首页> 外国专利> PARTS FOR VACUUM FILM DEPOSITION SYSTEM, VACUUM FILM DEPOSITION SYSTEM USING THE SAME, TARGET DEVICE, AND VACUUM FILM DEPOSITION METHOD

PARTS FOR VACUUM FILM DEPOSITION SYSTEM, VACUUM FILM DEPOSITION SYSTEM USING THE SAME, TARGET DEVICE, AND VACUUM FILM DEPOSITION METHOD

机译:真空膜沉积系统的零件,使用相同的真空膜沉积系统,目标设备和真空膜沉积方法

摘要

PROBLEM TO BE SOLVED: To stably and effectively prevent the peel-off of a film deposition material adhering to parts for vacuum film deposition system, a target, and a backing plate during a film deposition process, the peel-off of a sprayed deposit itself, and further the falling of particles from a deposit and also to suppress the increase in film deposition cost attendant on cleaning, or the like.;SOLUTION: The parts for vacuum film deposition system have a base material for parts and a sprayed deposit formed on the surface of the base material for parts, and further, the sprayed deposit has a basic film composition A at a place adjacent to the surface part of the base material and a basic film composition B in the surface part of the sprayed deposit and also has a gradient composition at least in a part of a space between the basic film composition A and the basic film composition B. The vacuum film deposition system is constituted by applying the above parts for vacuum film deposition system to a film-deposition sample holding part, a film- deposition source holding part, deposition preventing parts, or the like. The target device is constituted by depositing a similar sprayed deposit onto the surface of a noneroded area of the target body and the surface of the backing plate body.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:为了在膜沉积过程中稳定有效地防止粘附在真空膜沉积系统,靶材和背板上的膜沉积材料的剥离,喷涂沉积物本身的剥离;解决方案:用于真空成膜系统的零件具有零件的基材和在其上形成的喷涂沉积物另外,喷雾沉积物在与基材的表面部分相邻的位置处具有碱性膜组合物A,并且在喷雾沉积物的表面部分中具有碱性膜组合物B,并且还具有至少在基础膜组合物A和基础膜组合物B之间的空间的一部分中具有梯度组合物。真空膜沉积系统是通过将上述部分用于真空膜沉积而构成的。膜沉积样品保持部件,膜沉积源保持部件,沉积防止部件等的清洗系统。通过在靶体的无腐蚀区域的表面和背板体的表面上沉积类似的喷涂沉积物来构成靶装置。COPYRIGHT:(C)2002,JPO

著录项

  • 公开/公告号JP2002088464A

    专利类型

  • 公开/公告日2002-03-27

    原文格式PDF

  • 申请/专利权人 TOSHIBA CORP;

    申请/专利号JP20000275888

  • 发明设计人 SATO MICHIO;

    申请日2000-09-12

  • 分类号C23C14/00;C23C4/00;C23C14/34;C23C16/44;H01L21/203;H01L21/205;

  • 国家 JP

  • 入库时间 2022-08-22 00:56:04

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