FILM FORMATION METHOD BY VACUUM DEPOSITION, FILM FORMATION SYSTEM BY VACUUM DEPOSITION, AND CRYSTALLINE VACUUM DEPOSITION FILM

摘要

PROBLEM TO BE SOLVED: To provide a new and effective means to highly crystallize a vacuum deposition film when forming the vacuum deposition film of an organic semiconductor.SOLUTION: The film formation method by vacuum deposition uses, as a concurrently evaporating substance, an inactive molecule which has vapor pressure of 1 Pa or less at room temperature but shows higher vapor pressure than that of an organic semiconductor molecule, evaporates or sublimes under the vacuum deposition condition, and exhibits volatility on a heated substrate, when vacuum-depositing the organic semiconductor molecule constituting the vapor deposition film of the organic semiconductor on the substrate.