Vacuum deposition method, vacuum deposition system, crystalline vacuum deposition film
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机译:真空沉积方法,真空沉积系统,晶体真空沉积膜
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摘要
PROBLEM TO BE SOLVED: To provide a new and effective means to highly crystallize a vacuum deposition film when forming the vacuum deposition film of an organic semiconductor.SOLUTION: The film formation method by vacuum deposition uses, as a concurrently evaporating substance, an inactive molecule which has vapor pressure of 1 Pa or less at room temperature but shows higher vapor pressure than that of an organic semiconductor molecule, evaporates or sublimes under the vacuum deposition condition, and exhibits volatility on a heated substrate, when vacuum-depositing the organic semiconductor molecule constituting the vapor deposition film of the organic semiconductor on the substrate.
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