INTERDIGITAL CAPACITOR IN SPLIT-GATE FLASH TECHNOLOGY

摘要

PROBLEM TO BE SOLVED: To provide an interdigital capacitor in a split-gate flash technology.SOLUTION: The present invention relates to a substrate having a test line character and a formation method thereof. The test line character is used for identifying a test line on an integrated chip. The substrate prevents contamination in a high dielectric metal gate process. In several embodiments, the substrate is a semiconductor substrate. A test line character structure is installed on the semiconductor substrate, and has one or more trenches extending vertically between an upper surface of the test line character structure and a lower surface of the test line character structure. The test line character structure includes a test line character formed in a character shape of at least either alphabet or numbers. The one or more trenches are installed in the test line character structure and form an opening to the upper surface of the test line structure.SELECTED DRAWING: Figure 5