Blank made of TiO2-doped quartz glass, optical element for EUV lithography and EUV lithography system with it

摘要

The invention relates to a blank (4) made of TiO 2 -doped quartz glass which has streaks (6) which have a spacing (A) of less than 0.5 mm, preferably less than 0.3 mm, in particular less than 0, 05 mm or more than 0.5 mm, preferably of more than 1 mm, more preferably of more than 2 mm, in particular of more than 5 mm to each other, said streaks (6) at least in one to an end face (4a) of the blank (4) adjacent volume range are each aligned at an angle between 70 ° and 110 °, preferably between 80 ° and 100 °, in particular between 85 ° and 95 ° to the end face (4a) of the blank (4). The invention also relates to optical elements for EUV lithography, which are produced in particular from such a blank (4), and to an EUV lithography system which has at least one such optical element.