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Predicting overlay errors on device wafers due to the interaction of optical and EUV lithography fabrication processes

机译：预测由于光学和EUV光刻制造工艺的相互作用而导致的器件晶圆上的覆盖错误

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作者
Zheng, Liang;
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作者单位

The University of Wisconsin - Madison;

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授予单位 The University of Wisconsin - Madison;
学科
学位 Ph.D.
年度 2006
页码 164 p.
总页数 164
原文格式 PDF
正文语种 eng
中图分类
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专利

1. Investigation of overlay errors due to the interaction of optical and extreme ultraviolet mask fabrication processes [J] . L. Zheng, R. L. Engelstad, E. G. Lovell Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2005,第6期

机译：研究由于光学和极紫外掩模制造工艺的相互作用而导致的覆盖误差
2. Predicting distortions and overlay errors due to wafer deformation during chucking on lithography scanners [J] . Kevin T. Turner Sathish Veeraraghavan and Jaydeep K. Sinha Journal of Micro/Nanolithography,MEMS and MOEMS . 2009,第4期

机译：预测在光刻扫描仪吸盘期间由于晶片变形而引起的变形和覆盖误差
3. Fabrication and Replication of Polymer Integrated Optical Devices Using Electron-Beam Lithography and Soft Lithography [J] . Yanyi Huang, George T.Paloczi, Amnon Yariv, The journal of physical chemistry, B. Condensed matter, materials, surfaces, interfaces & biophysical . 2004,第25期

机译：电子束光刻和软光刻技术制造和集成聚合物集成光学器件
4. Integration of the fabrication processes and wafer level packaging of optical MEMS devices using localized induction heating [C] . HsuehAn Yang, Mingching Wu, Weileun Fang IEEE/LEOS International Conference on Optical MEMS . 2003

机译：使用局部感应加热的光学MEMS器件的制造工艺和晶片级包装的整合
5. Design, fabrication, and optical analysis of nanomirrors for maskless EUV lithography [D] . Shroff, Yashesh Ajitbhai 2003

机译：用于无掩模EUV光刻的纳米镜的设计，制造和光学分析
6. Microfluidic devices fabricated using fast wafer-scale LED-lithography patterning [O] . Pavan K. Challa, Tadas Kartanas, Jérôme Charmet, 2017

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7. Fabrication of miniaturized fluidic devices using SU-8 based lithography and low temperature wafer bonding [O] . P. Svasek A, E. Svasek A, B. Lendl B, 2004

机译：使用基于sU-8的光刻和低温晶片键合制造小型化流体装置

Predicting overlay errors on device wafers due to the interaction of optical and EUV lithography fabrication processes

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